In ELENA three scientific work packages (WPs) embrace the research programme; WP4; Synthetic and post exposure chemistry in FEBID and EUVL, WP5; fundamentals of electron induced chemistry in FEBID and EUVL and WP6; Nano-scale fabrication with FEBID and EUVL.
-WP4; Synthetic and post exposure chemistry in FEBID and EUVL.
The focuses on the design and synthesis of new FEBID molecular precursors and EUVL resist material and the design of new and selective chemical activation within EUVL resists with the aim of promoting electron induced decomposition of FEBID precursor molecules.
The main objectives are; i) to identify (in conjunction with WP5) promising molecular compositions suitable for FEBID and EUVL, ii) to provide novel precursors for fundamental investigations on their electron-initiated reactions relevant to either FEBID or EUVL within WG 5), and for testing FEBID and in EUVL applications within WP 6. iii) Identifying routes for chemically enhanced electron induced chemistry with in situ purification as focal point in conjunction with the work conducted within WP5 and 6.
-WP5; Fundamentals of electron induced chemistry in FEBID and EUVL,
The focuses on enhanced understanding of low energy electron interaction with potential FEBID precursor and with EUV resist materials as well as the exploration of means to direct and assist chemistry to advance these nanofabrication techniques.
The main objectives are: i) to identify (in conjunction with WG4) promising molecular compositions suitable for FEBID and EUVL, ii) provide guidance for targeted molecular modifications to positively direct the electron induced chemistry in FEBIP and in EUVL, iii) seek new approaches to chemically enhance favorable electron molecule interactions with in situ processing components, and iv) explore new avenues for quantification of electron induced reactions.
-WP6; Nano-scale fabrication with FEBID and EUVL.
The current aim of photolithography is to achieve resolution of the order of 10 nm by the deployment of EUV radiation, using an exposure wavelength of 13.5 nm. Currently used chemically amplified photoresists, however, have been developed for use with UV light, and for EUVL do not deliver the required performance with regards to the key photolithographic parameters; resolution, material sensitivity, line width roughness and pattern collapse.
Likewise, the bulk of the FEBID precursors used today are drawn from an assortment of commercially available CVD precursors. These compounds are typically not perfect for FEBID as they were developed and optimized for thermally induced decomposition. By attaining control over the electron induced chemistry using specifically tailoring FEBID molecules we intend to advance FEBID to a commercially viable technology well beyond that of its current commercial use for mask repair.
Importantly, the chemistries of EUVL and FEBID materials are governed by the same principles, and we postulate that it is possible to apply the same or similar approaches to both fields. The main objective of WP6 is thus to identify and apply materials and methods to bring both FEBID and EUVL beyond their current limitations. Hence, WP6 will exchange knowledge and new materials with participants in WP4 and WP5 in order to advance these two nanofabrication technologies.